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Proceedings Paper

Pattern matching for double patterning technology-compliant physical design flows
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Paper Abstract

A pattern-based methodology for guiding the generation of DPT-compliant layouts using a foundry-characterized library of "difficult to decompose" patterns with known corresponding solutions is presented. A pattern matching engine scans the drawn layout for patterns from the pattern library. If a match were found, one or more DPT-compliant solutions would be provided for guiding the layout modifications. This methodology is demonstrated on a sample 1.8 mm2 layout migrated from a previous technology. A small library of 12 patterns is captured, which accounts for 59 out of the 194 DPT-compliance check violations examined. In addition, the methodology can be used to recommend specific changes to the original drawn design to improve manufacturability. This methodology is compatible with any physical design flows that use automated decomposition algorithms.

Paper Details

Date Published: 15 March 2012
PDF: 9 pages
Proc. SPIE 8327, Design for Manufacturability through Design-Process Integration VI, 832708 (15 March 2012); doi: 10.1117/12.916581
Show Author Affiliations
Lynn T.-N. Wang, GLOBALFOUNDRIES Inc. (United States)
Vito Dai, GLOBALFOUNDRIES Inc. (United States)
Luigi Capodieci, GLOBALFOUNDRIES Inc. (United States)


Published in SPIE Proceedings Vol. 8327:
Design for Manufacturability through Design-Process Integration VI
Mark E. Mason, Editor(s)

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