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Proceedings Paper

Directed self-assembly of laterally confined lamellae-forming diblock copolymers: polydispersity and substrate interaction effects
Author(s): Hassei Takahashi; Nabil Laachi; Su-Mi Hur; Corey J. Weinheimer; David Shykind; Glenn H. Fredrickson
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Paper Abstract

Theoretical methods are critical to our understanding of defect formation in block copolymer lithography processes. We have previously applied self-consistent field theory (SCFT) to study the energetics of dislocation and disclination defects prevalent in graphoepitaxy of "standing up" lamellae, and present results of a further refined approach accounting for polydispersity and polymer-substrate interactions. Broadening the scope of our investigation to include systems that deviate from the ideal monodisperse and neutral substrate conditions provides insight into how precisely these factors must be controlled to effectively suppress defects experimentally.

Paper Details

Date Published: 21 March 2012
PDF: 6 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231N (21 March 2012); doi: 10.1117/12.916578
Show Author Affiliations
Hassei Takahashi, Univ. of California, Santa Barbara (United States)
Nabil Laachi, Univ. of California, Santa Barbara (United States)
Su-Mi Hur, Univ. of California, Santa Barbara (United States)
Corey J. Weinheimer, Intel Corp. (United States)
David Shykind, Intel Corp. (United States)
Glenn H. Fredrickson, Univ. of California, Santa Barbara (United States)


Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

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