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Proceedings Paper

Mutual source, mask and projector pupil optimization
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Paper Abstract

This paper presents a combined source/mask/projector pupil optimization (SMPO) procedure, aiming at the maximization of the common process window of different line/space configurations. The parameters are given by a pixelated source representation, sizes of the main features and the SRAF configuration. The projector wavefront is varied through the coefficients of the Fringe/Zernike polynomials for spherical aberrations. A genetic algorithm is applied as the underlying optimization algorithm. A number of results are presented and discussed, demonstrating the feasibility and potentials of the approach.

Paper Details

Date Published: 13 March 2012
PDF: 12 pages
Proc. SPIE 8326, Optical Microlithography XXV, 83260I (13 March 2012); doi: 10.1117/12.916529
Show Author Affiliations
Tim Fühner, Fraunhofer Institute for Integrated Systems and Device Technology (Germany)
Peter Evanschitzky, Fraunhofer Institute for Integrated Systems and Device Technology (Germany)
Andreas Erdmann, Fraunhofer Institute for Integrated Systems and Device Technology (Germany)


Published in SPIE Proceedings Vol. 8326:
Optical Microlithography XXV
Will Conley, Editor(s)

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