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Proceedings Paper

Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy
Author(s): Chi-Chun Liu; Jed Pitera; Neal Lafferty; Kafai Lai; Charles Rettner; Melia Tjio; Noel Arellano; Joy Cheng
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Paper Abstract

A photomask design flow for generating guiding patterns used in graphoepitaxial DSA processes is proposed and tested. In this flow, a new fast DSA model is employed for DSA structure verification. The execution speed and accuracy of the fast model were benchmarked with our previously reported Monte Carlo method. We demonstrated the process window verification using the OPC/DSA flow with the fast DSA model and compared this with experimental results in the guiding patterns simulated by e-beam lithography.

Paper Details

Date Published: 21 March 2012
PDF: 7 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83230X (21 March 2012); doi: 10.1117/12.916525
Show Author Affiliations
Chi-Chun Liu, IBM Almaden Research Ctr. (United States)
Jed Pitera, IBM Almaden Research Ctr. (United States)
Neal Lafferty, IBM Microelectronics (United States)
Kafai Lai, IBM Microelectronics (United States)
Charles Rettner, IBM Almaden Research Ctr. (United States)
Melia Tjio, IBM Almaden Research Ctr. (United States)
Noel Arellano, IBM Almaden Research Ctr. (United States)
Joy Cheng, IBM Almaden Research Ctr. (United States)


Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

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