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Proceedings Paper

Ultrahigh 22-nm resolution EUV coherent diffraction imaging using a tabletop 13-nm high harmonic source
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Paper Abstract

We implement coherent diffractive imaging (CDI) using a phase-matched high-harmonic generation (HHG) source at 13 nm, demonstrating reconstructed images with a record 22 nm resolution for any tabletop, light-based microscope. We also demonstrate the first reflection-mode CDI using a compact extreme ultraviolet (EUV) source, achieving ≈100 nm resolution. A clear path towards even higher spatial resolution reflection-mode tabletop imaging using apertured-illumination schemes will be discussed.

Paper Details

Date Published: 3 April 2012
PDF: 7 pages
Proc. SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 83240D (3 April 2012); doi: 10.1117/12.916524
Show Author Affiliations
Matthew D. Seaberg, Univ. of Colorado at Boulder (United States)
Daniel E. Adams, Univ. of Colorado at Boulder (United States)
Bosheng Zhang, Univ. of Colorado at Boulder (United States)
Dennis F. Gardner, Univ. of Colorado at Boulder (United States)
Margaret M. Murnane, Univ. of Colorado at Boulder (United States)
Henry C. Kapteyn, Univ. of Colorado at Boulder (United States)


Published in SPIE Proceedings Vol. 8324:
Metrology, Inspection, and Process Control for Microlithography XXVI
Alexander Starikov, Editor(s)

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