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Proceedings Paper

Effects of nylon filter properties on contact-hole photoresist imaging performance and defectivity
Author(s): M. Cronin; N. Vitorino; V. Monreal; J. Zook
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Paper Abstract

Previous studies of contact-hole photoresist-performance1 with various filter membranes demonstrated that UPE (ultra high molecular weight polyethylene) membranes are effective in reducing defectivity with minimal changes in the resist's imaging properties. In the same study, nylon membrane filters, known to have absorptive properties, altered the lithographic imaging performance of the photoresist and produced higher overall defectivity. This study more closely examines the absorption effects of nylon membrane on contact hole photoresist and attempts to quantify changes to the photoresist by measuring the change in lithographic performance, and its' effect on defectivity. Additionally, this study provides recommendations on the filtration parameters which take advantage of the absorptive capability of the nylon membrane, while minimizing the changes to the lithographic performance of the photoresist.

Paper Details

Date Published: 19 March 2012
PDF: 7 pages
Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83252M (19 March 2012); doi: 10.1117/12.916508
Show Author Affiliations
M. Cronin, Entegris, Inc. (United States)
N. Vitorino, AZ Electronic Materials USA Corp. (United States)
V. Monreal, AZ Electronic Materials USA Corp. (United States)
J. Zook, AZ Electronic Materials USA Corp. (United States)


Published in SPIE Proceedings Vol. 8325:
Advances in Resist Materials and Processing Technology XXIX
Mark H. Somervell; Thomas I. Wallow, Editor(s)

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