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Proceedings Paper

A scoring methodology for quantitatively evaluating the quality of double patterning technology-compliant layouts
Author(s): Lynn T.-N. Wang; Sriram Madhavan; Shobhit Malik; Piyush Pathak; Luigi Capodieci
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Paper Abstract

A Double Patterning Technology (DPT)-aware scoring methodology that systematically quantifies the quality of DPTcompliant layout designs is described. The methodology evaluates layouts based on a set of DPT-specific metrics that characterizes layout-induced process variation. Specific metrics include: the spacing variability between two adjacent oppositely-colored features, the density differences between the two exposure masks, and the stitching area's sensitivity to mask misalignment. These metrics are abstracted to a scoring scale from 0 to 1 such that 1 is the optimum. This methodology provides guidance for opportunistic layout modifications so that DPT manufacturability-related issues are mitigated earlier in design. Results show that by using this methodology, a DPT-compliant layout improved from a composite score of 0.66 and 0.78 by merely changing the decomposition solution so that the density distribution between the two exposure masks is relatively equal.

Paper Details

Date Published: 14 March 2012
PDF: 11 pages
Proc. SPIE 8327, Design for Manufacturability through Design-Process Integration VI, 832718 (14 March 2012); doi: 10.1117/12.916494
Show Author Affiliations
Lynn T.-N. Wang, GLOBALFOUNDRIES Inc. (United States)
Sriram Madhavan, GLOBALFOUNDRIES Inc. (United States)
Shobhit Malik, GLOBALFOUNDRIES Inc. (United States)
Piyush Pathak, GLOBALFOUNDRIES Inc. (United States)
Luigi Capodieci, GLOBALFOUNDRIES Inc. (United States)

Published in SPIE Proceedings Vol. 8327:
Design for Manufacturability through Design-Process Integration VI
Mark E. Mason, Editor(s)

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