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Proceedings Paper

Positive-tone chemically amplified fullerene resist
Author(s): J. Manyam; A. Frommhold; D. X. Yang; A. McClelland; M. Manickam; J. A. Preece; R. E. Palmer; A. P. G. Robinson
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Paper Abstract

With continuing efforts to achieve higher lithographic resolution there has been on-going interest in the development of low molecular weight resists, such as molecular glasses. Here we present the initial results of a study into the development of a positive tone two component chemically amplified resist based on methanofullerene derivatives (MF) with acid labile groups (tert-butyl acetate (tBAC); tert-butoxycarbonyl (tBOC)). Mono, di, tris and hexa adducts of MFtBAC together with mono and di adducts of MF-tBOC have been evaluated with several photoacid generators. Sensitivities as high as 11 μC/cm2 have been achieved in some cases and sub-100 nm features have been patterned.

Paper Details

Date Published: 19 March 2012
PDF: 9 pages
Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83251U (19 March 2012); doi: 10.1117/12.916472
Show Author Affiliations
J. Manyam, The Univ. of Birmingham (United Kingdom)
A. Frommhold, The Univ. of Birmingham (United Kingdom)
D. X. Yang, The Univ. of Birmingham (United Kingdom)
A. McClelland, The Univ. of Birmingham (United Kingdom)
M. Manickam, The Univ. of Birmingham (United Kingdom)
J. A. Preece, The Univ. of Birmingham (United Kingdom)
R. E. Palmer, The Univ. of Birmingham (United Kingdom)
A. P. G. Robinson, The Univ. of Birmingham (United Kingdom)


Published in SPIE Proceedings Vol. 8325:
Advances in Resist Materials and Processing Technology XXIX
Mark H. Somervell; Thomas I. Wallow, Editor(s)

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