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Proceedings Paper

Combinatorial process optimization for negative photo-imageable spin-on dielectrics and investigation of post-apply bake and post-exposure bake interactions
Author(s): Jihoon Kim; Ruzhi M. Zhang; Elizabeth Wolfer; Bharatkumar K. Patel; Medhat Toukhy; Zachary Bogusz; Tatsuro Nagahara
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Paper Abstract

Patternable dielectric materials were developed and introduced to reduce semiconductor manufacturing complexity and cost of ownership (CoO). However, the bestowed dual functionalities of photo-imageable spin-on dielectrics (PSOD) put great challenges on the material design and development. In this work, we investigated the combinatorial process optimization for the negative-tone PSOD lithography by employing the Temperature Gradient Plate (TGP) technique which significantly reduced the numbers of wafers processed and minimized the developmental time. We demonstrated that this TGP combinatorial is very efficient at evaluating the effects and interactions of several independent variables such as post-apply bake (PAB) and post-exposure bake (PEB). Unlike most of the conventional photoresists, PAB turned out to have a great effect on the PSOD pattern profiles. Based on our extensive investigation, we observed great correlation between PAB and PEB processes. In this paper, we will discuss the variation of pattern profiles as a matrix of PAB and PEB and propose two possible cross-linking mechanisms for the PSOD materials to explain the unusual experimental results.

Paper Details

Date Published: 20 March 2012
PDF: 12 pages
Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83252A (20 March 2012); doi: 10.1117/12.916453
Show Author Affiliations
Jihoon Kim, AZ Electronic Materials USA Corp. (United States)
Ruzhi M. Zhang, AZ Electronic Materials USA Corp. (United States)
Elizabeth Wolfer, AZ Electronic Materials USA Corp. (United States)
Bharatkumar K. Patel, AZ Electronic Materials USA Corp. (United States)
Medhat Toukhy, AZ Electronic Materials USA Corp. (United States)
Zachary Bogusz, AZ Electronic Materials USA Corp. (United States)
Tatsuro Nagahara, AZ Electronic Materials K.K. (Japan)


Published in SPIE Proceedings Vol. 8325:
Advances in Resist Materials and Processing Technology XXIX
Mark H. Somervell; Thomas I. Wallow, Editor(s)

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