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Proceedings Paper

Energetic ion and neutral energy analyzer for extreme-ultraviolet light sources
Author(s): Daniel Andruczyk; John Sporre; Dan Elg; Tae Cho; David N. Ruzic
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Paper Abstract

The Center for Plasma-Material Interactions has developed a detector capable of diagnosing the energetic ion and neutral spectrums emanating from extreme ultraviolet light sources. This tool has been used in the past for high-power output sources, but it is readily evident that actinic inspections tools require the use of debris mitigation analyzers. Using this tool, manufacturers can optimize the use of debris mitigation techniques, as well as analyze the effects brightness increases have on tool lifetime.

Paper Details

Date Published: 23 March 2012
PDF: 14 pages
Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 832237 (23 March 2012); doi: 10.1117/12.916437
Show Author Affiliations
Daniel Andruczyk, Univ. of Illinois at Urbana-Champaign (United States)
John Sporre, Univ. of Illinois at Urbana-Champaign (United States)
Dan Elg, Univ. of Illinois at Urbana-Champaign (United States)
Tae Cho, Univ. of Illinois at Urbana-Champaign (United States)
David N. Ruzic, Univ. of Illinois at Urbana-Champaign (United States)


Published in SPIE Proceedings Vol. 8322:
Extreme Ultraviolet (EUV) Lithography III
Patrick P. Naulleau; Obert R. Wood, Editor(s)

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