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Proceedings Paper

Fast source independent estimation of lithographic difficulty supporting large scale source optimization
Author(s): David DeMaris; Maria Gabrani; Sankha Subhra Sarkar; Nathalie Casati; Ronald Luijten; Kafai Lai; Kehan Tian
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Paper Abstract

Many chip design and manufacturing applications including design rules development, optical proximity correction tuning, and source optimization can benefit from rapid estimation of relative difficulty or printability. Simultaneous source optimization of thousands of clips has been demonstrated recently, but presents performance challenges. We describe a fast, source independent method to identify patterns which are likely to dominate the solution. In the context of source optimization the estimator may be used as a filter after clustering, or to influence the selection of representative cluster elements. A weighted heuristic formula identifies spectral signatures of several factors contributing to difficulty. Validation methods are described showing improved process window and reduced error counts on 22 nm layout compared with programmable illuminator sources derived from hand picked patterns, when the formula is used to influence training clip selection in source optimization. We also show good correlation with fail prediction on a source produced with hand picked training clips with some level of optical proximity correction tuning.

Paper Details

Date Published: 13 March 2012
PDF: 8 pages
Proc. SPIE 8326, Optical Microlithography XXV, 832614 (13 March 2012); doi: 10.1117/12.916433
Show Author Affiliations
David DeMaris, IBM Systems & Technology Group (United States)
Maria Gabrani, IBM Zürich Research Lab. (Switzerland)
Sankha Subhra Sarkar, IBM Zürich Research Lab. (Switzerland)
Nathalie Casati, IBM Zürich Research Lab. (Switzerland)
Ronald Luijten, IBM Zürich Research Lab. (Switzerland)
Kafai Lai, IBM Semiconductor Research and Development (United States)
Kehan Tian, IBM Semiconductor Research and Development (United States)

Published in SPIE Proceedings Vol. 8326:
Optical Microlithography XXV
Will Conley, Editor(s)

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