Share Email Print
cover

Proceedings Paper

Synthesis and characterization of self-assembling block copolymers containing fluorine groups
Author(s): Rina Maeda; Michelle Chavis; Nam-Ho You; Christopher K. Ober
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The fluorine-containing block copolymers of poly(styrene-block-2,2,2-trifluoroethyl methacrylate) (PS-b-PTFEMA) and poly(4-hydroxystyrene-block-2,2,2-trifluoroethyl methacrylate) (PHOST-b-PTFEMA), which all are capable of both top-down and bottom-up lithography were developed. The reported block copolymers were synthesized by either anionic polymerization or atom transfer radical polymerization (ATRP). Characterization of bulk and thin films were carried out using differential scanning calorimetry (DSC), transmission electron microscopy (TEM) and small angle X-ray scattering (SAXS). Thin films of the resulting block copolymers were subjected to conventional lithographic processing using e-beam and deep-UV radiation to create integrated patterns such as dots in lines.

Paper Details

Date Published: 21 March 2012
PDF: 7 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83230E (21 March 2012); doi: 10.1117/12.916418
Show Author Affiliations
Rina Maeda, Tokyo Institute of Technology (Japan)
Michelle Chavis, Cornell Univ. (United States)
Nam-Ho You, Cornell Univ. (United States)
Christopher K. Ober, Cornell Univ. (United States)


Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

© SPIE. Terms of Use
Back to Top