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Proceedings Paper

Implementation of reflectivity control on block mask lithography at 20 and 14nm nodes
Author(s): Steven J. Holmes; Anuja De Silva; Juan-Manuel Gomez; Bidan Zhang; Hong Kry; Libor Vyklicky; Ranee Kwong; Kuang-Jung Chen; Sen Liu; Matthew Colburn; Rao Varanasi; Daiji Kawamura; Gregory R. McIntyre; Narasim Kanike; Masanori Kato; Xintuo Dai; Romain Lallement
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Paper Details

Date Published:
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Proc. SPIE 8326, Optical Microlithography XXV, 83260P; doi: 10.1117/12.916415
Show Author Affiliations
Steven J. Holmes, IBM Thomas J. Watson Research Ctr. (United States)
Anuja De Silva, GLOBALFOUNDRIES Inc. (United States)
Juan-Manuel Gomez, IBM Corp. (United States)
Bidan Zhang, IBM Corp. (United States)
Hong Kry, IBM Corp. (United States)
Libor Vyklicky, IBM Thomas J. Watson Research Ctr. (United States)
Ranee Kwong, IBM Corp. (United States)
Kuang-Jung Chen, IBM Corp. (United States)
Sen Liu, IBM Corp. (United States)
Matthew Colburn, IBM Corp. (United States)
Rao Varanasi, IBM Corp. (United States)
Daiji Kawamura, IBM Corp. (United States)
Gregory R. McIntyre, IBM Corp. (United States)
Narasim Kanike, IBM Corp. (United States)
Masanori Kato, IBM Corp. (United States)
Xintuo Dai, GLOBALFOUNDRIES Inc. (United States)
Romain Lallement, STMicroelectronics (United States)


Published in SPIE Proceedings Vol. 8326:
Optical Microlithography XXV
Will Conley, Editor(s)

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