Share Email Print
cover

Proceedings Paper

Integrated lithography to prepare arrays of rounded nano-objects
Author(s): Áron Sipos; Anikó Szalai; Mária Csete
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

An integrated lithography method is presented to prepare rounded nano-objects with variable shape, in arrays with arbitrary symmetry and wavelength-scaled periodicity. Finite element method was applied to determine the near-field confinement under monolayers of silver and gold colloid spheres illuminated by circularly polarized beams possessing periodic intensity distribution, and to predict the shape of nano-objects, which can be fabricated on thin noble metal layers on glass substrates. It was shown that illumination by perpendicularly incident homogeneous beam results in hexagonal array of uniform nano-rings, while uniform nano-crescents appear due to single obliquely incident beam. Illumination of colloid sphere monolayers by interfering beams causes development of co-existent nano-rings and nanocrescents. It was demonstrated that the periodicity of complex patterns is determined by the wavelength and angle of incidence; the inter-object distance is controlled by the relative orientation of interference patterns with respect to colloid sphere monolayers; the nano-object size is determined by the wavelength, sphere diameter and material; while the nearfield distribution sensitively depends on the direction of illumination by circularly polarized light. We present complex patterns of various rounded nano-objects that can be uniquely fabricated via Circular Integrated Interference and Colloid sphere Lithography (CIICL), and applied as plasmonic and meta-materials.

Paper Details

Date Published: 21 March 2012
PDF: 10 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83232E (21 March 2012); doi: 10.1117/12.916403
Show Author Affiliations
Áron Sipos, Univ. of Szeged (Hungary)
Anikó Szalai, Univ. of Szeged (Hungary)
Mária Csete, Univ. of Szeged (Hungary)


Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

© SPIE. Terms of Use
Back to Top