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Proceedings Paper

Overlay quality metric
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Paper Abstract

As overlay budget continues to shrink, an improved analysis of the different contributors to this budget is needed. A major contributor that has never been quantified is the accuracy of the measurements. KLA-Tencor developed a quality metric, that calculates and attaches an accuracy value to each OVL target. This operation is performed on the fly during measurement and can be applied without affecting MAM time or throughput. Using a linearity array we demonstrate that the quality metric identifies targets deviating from the intended OVL value, with no false alarms.

Paper Details

Date Published: 5 April 2012
PDF: 7 pages
Proc. SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 832424 (5 April 2012); doi: 10.1117/12.916379
Show Author Affiliations
Guy Cohen, KLA-Tencor Israel (Israel)
Eran Amit, KLA-Tencor Israel (Israel)
Dana Klein, KLA-Tencor Israel (Israel)
Daniel Kandel, KLA-Tencor Israel (Israel)
Vladimir B. Levinski, KLA-Tencor Israel (Israel)

Published in SPIE Proceedings Vol. 8324:
Metrology, Inspection, and Process Control for Microlithography XXVI
Alexander Starikov, Editor(s)

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