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Proceedings Paper

Feasibility study of character projection-based electron-beam direct writing for logic LSI wiring including automatically routed area with 14nm node technology case
Author(s): Shinji Sugatani; Takashi Maruyama; Yoshinori Kojima; Yasushi Takahashi; Masaki Takakuwa; Shuzo Ohshio; Masaru Ito
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Paper Abstract

Multi column cell (MCC) exposure system is a promising candidate for the next generation lithography tool. The concept of MCC is parallelization of the electron beam columns with character projection (CP) [1]. In this paper, we would like to describe current CP techniques being used for product manufacturing. We also would like to introduce CP based EBDW method to draw automatically routed wiring area with 14 nm node technology of 20nm half-pitch (hp) case. Pattern density influence for process margin and shot noise tolerance consideration are discussed. Feasibility study of the model character set for router generated wiring drawing is presented.

Paper Details

Date Published: 21 March 2012
PDF: 7 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 832329 (21 March 2012); doi: 10.1117/12.916358
Show Author Affiliations
Shinji Sugatani, e-Shuttle, Inc. (Japan)
Takashi Maruyama, e-Shuttle, Inc. (Japan)
Yoshinori Kojima, e-Shuttle, Inc. (Japan)
Yasushi Takahashi, e-Shuttle, Inc. (Japan)
Masaki Takakuwa, Advantest Corp. (Japan)
Shuzo Ohshio, e-Shuttle, Inc. (Japan)
Masaru Ito, Fujitsu Semiconductor Ltd. (Japan)


Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

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