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Proceedings Paper

Study of actinic dark-field inspection with programmed amplitude defects
Author(s): Noriaki Takagi; Takeshi Yamane; Yukiyasu Arisawa; Tsuneo Terasawa
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Paper Abstract

In this work, a simulation for actinic dark-field inspection with amplitude defects was carried out. The simulation was then followed by experiments on actinic dark-field inspection with programmed amplitude defects. For this experiment, the programmed amplitude defects were fabricated using EB exposure. The simulated result showed that the intensity signal was influenced by the thickness and width of the amplitude defect. The simulated results were then confirmed by the experiments. The tendency of the result was approximately similar to the simulated results. However, the dependency on the two factors of defect thickness and defect width is not similar to the simulated results. As the factors of difference, difference of defect edge angle and element of defect model expected.

Paper Details

Date Published: 23 March 2012
PDF: 8 pages
Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 832235 (23 March 2012); doi: 10.1117/12.916320
Show Author Affiliations
Noriaki Takagi, EUVL Infrastructure Development Ctr., Inc. (Japan)
Takeshi Yamane, EUVL Infrastructure Development Ctr., Inc. (Japan)
Yukiyasu Arisawa, EUVL Infrastructure Development Ctr., Inc. (Japan)
Tsuneo Terasawa, EUVL Infrastructure Development Ctr., Inc. (Japan)


Published in SPIE Proceedings Vol. 8322:
Extreme Ultraviolet (EUV) Lithography III
Patrick P. Naulleau; Obert R. Wood, Editor(s)

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