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Proceedings Paper

Laser-produced plasma UTA emission in 3-7nm spectral region
Author(s): Takeshi Higashiguchi; Takamitsu Otsuka; Noboru Yugami; Weihua Jiang; Akira Endo; Bowen Li; Colm O'Gorman; Thomas Cummins; Deirdre Kilbane; Padraig Dunne; Gerard O'Sullivan
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Paper Abstract

We demonstrate a table-top strong band emission water window source based on laser-produced high-Z plasmas. Resonance emission from multiply charged ions merges to produce intense unresolved transition arrays in the 2 to 4 nm region, extending below the carbon K edge (4.37 nm). Arrays resulting from n = 4-n = 4 transitions are overlaid with n = 4-n = 5 emission and shift to shorter wavelength with increasing atomic number. Under spectral analysis a guideline for microscope construction design for single-shot live cell imaging is proposed based on the use of a bismuth plasma source, coupled with multilayer mirror optics.

Paper Details

Date Published: 23 March 2012
PDF: 9 pages
Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 83222J (23 March 2012); doi: 10.1117/12.916308
Show Author Affiliations
Takeshi Higashiguchi, Utsunomiya Univ. (Japan)
Takamitsu Otsuka, Utsunomiya Univ. (Japan)
Noboru Yugami, Utsunomiya Univ. (Japan)
Weihua Jiang, Nagaoka Univ. of Technology (Japan)
Akira Endo, Waseda Univ. (Japan)
Bowen Li, Univ. College Dublin (Ireland)
Colm O'Gorman, Univ. College Dublin (Ireland)
Thomas Cummins, Univ. College Dublin (Ireland)
Deirdre Kilbane, Univ. College Dublin (Ireland)
Padraig Dunne, Univ. College Dublin (Ireland)
Gerard O'Sullivan, Univ. College Dublin (Ireland)

Published in SPIE Proceedings Vol. 8322:
Extreme Ultraviolet (EUV) Lithography III
Patrick P. Naulleau; Obert R. Wood, Editor(s)

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