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Proceedings Paper

Impact of non-uniform polarized illumination on hyper-NA lithography
Author(s): Xuejia Guo; Yanqiu Li
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Paper Abstract

Conventional top-hat model of polarized illumination loses its accuracy in lithography simulation which cannot meet the requirements of 45nm node lithography and beyond. The simulation error of top-hat model in evaluating lithography performance cannot be neglected anymore. In this paper, we apply a Gaussian model to represent the non-uniform degree of polarization (NU-DOP) distribute across the pupil and evaluate its impact on the CD uniformity under various conditions. The result shows that the model can accurately evaluate the non-uniform property of polarized illuminator. When the mean NU-DOP approaches to 1, the effect of non-uniformity becomes more pronounced. Furthermore, the non-uniform of DOP distribution causes more CD error at defocus position.

Paper Details

Date Published: 13 March 2012
PDF: 7 pages
Proc. SPIE 8326, Optical Microlithography XXV, 832623 (13 March 2012); doi: 10.1117/12.916307
Show Author Affiliations
Xuejia Guo, Beijing Institute of Technology (China)
Yanqiu Li, Beijing Institute of Technology (China)


Published in SPIE Proceedings Vol. 8326:
Optical Microlithography XXV
Will Conley, Editor(s)

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