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Proceedings Paper

Design of a high positioning contact probe for plasmonic lithography
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Paper Abstract

We suggest a geometrically modified probe to achieve high positioning accuracy for plasmonic lithography which can record nanometer scale features and has high throughput. Instead of a cantilever probe, we propose a circular probe which has arc-shaped arms that hold the tip at the center. The modified probe is based on the fixed-fixed beam in material mechanics. To calculate the tip displacement, we used a finite element method (FEM) for a circular probe and compared the results with cantilever probe. We considered a silicon-based micro-fabrication process to design the probe. The probe has a square outline boundary with a length of 50μm, four arms, and a pyramidal tip with a height of 5μm. The ratio of the lateral tip displacement to the vertical deflection was evaluated to indicate the positioning accuracy. The probe has higher accuracy by a factor of 103 and 10 in approach mode and scan mode, respectively, compared to a cantilever probe. We expect that a circular probe is appropriate for the applications that require high positioning accuracy, such as nanolithography with a contact probe and multiple-probe arrays.

Paper Details

Date Published: 21 March 2012
PDF: 6 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 832322 (21 March 2012); doi: 10.1117/12.916274
Show Author Affiliations
Jinhee Jang, Yonsei Univ. (Korea, Republic of)
Yongwoo Kim, Yonsei Univ. (Korea, Republic of)
Seok Kim, Yonsei Univ. (Korea, Republic of)
Howon Jung, Yonsei Univ. (Korea, Republic of)
Jae Won Hahn, Yonsei Univ. (Korea, Republic of)

Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

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