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Proceedings Paper

A study of optical penetration into the micro-periodic structure of semiconductor devices
Author(s): Harutaka Sekiya; Mitsuhiro Togashi; Mitsunori Numata; Yasutsugu Usami; Suejin Cho; Yongdeok Jeong; Yusin Yang
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Paper Abstract

The shrinking of design rule requires the short wavelength light used in the optical inspection system. However, the existence of the condition that the long wavelength light becomes effective for the defect detection in line/space structure is known. Calculation results using numerical simulation showed that the probe light can penetrate to the line/space structure depending on the polarization even though the light has long wavelength. A new model was introduced to make theoretical explanation of this abnormal behavior of long wavelength light and the mechanism of optical penetration was clarified. In this model, the averaged extinction coefficient was calculated in consideration of the wavelength and the period of the line/space structure. Using this model, the transmittance was calculated and compared with simulations. The fact that the calculation result is agreed with the simulations showed this model's utility. This result shows that the probe light can reach to the bottom of line/space structure in the inspection system for semiconductor devices even though the light has long wavelength. It means that the long wavelength light can be used effectively for the defect detection of the micro periodic structure in the semiconductor inspection system.

Paper Details

Date Published: 3 April 2012
PDF: 9 pages
Proc. SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 83242T (3 April 2012); doi: 10.1117/12.916267
Show Author Affiliations
Harutaka Sekiya, Samsung Yokohama Research Institute Co., Ltd. (Japan)
Mitsuhiro Togashi, Samsung Yokohama Research Institute Co., Ltd. (Japan)
Mitsunori Numata, Samsung Yokohama Research Institute Co., Ltd. (Japan)
Yasutsugu Usami, Samsung Yokohama Research Institute Co., Ltd. (Japan)
Suejin Cho, Samsung Electronics Co., Ltd. (Korea, Republic of)
Yongdeok Jeong, Samsung Electronics Co., Ltd. (Korea, Republic of)
Yusin Yang, Samsung Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 8324:
Metrology, Inspection, and Process Control for Microlithography XXVI
Alexander Starikov, Editor(s)

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