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Proceedings Paper

Multi-step Scanning Probe Lithography (SPL) on calixarene with overlay alignment
Author(s): M. Kaestner; I. W. Rangelow
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Paper Abstract

To keep on with scaling down of nanoelectronic components novel lithographic approaches are required. The direct, positive-tone lithography of calixarene molecular resists by scanning probe techniques represents a promising alternative for ease-of-use sub-10 nm mask-less lithography. Herein, we demonstrate a closed loop tip-based nanolithography using the same nanoprobe for: (i) AFM pre-imaging for pattern overlay alignment; (ii) direct writing of features into calixarene molecular resist applying a highly confined, development-less removal process; and (iii) AFM post-imaging as final in-situ inspection. In addition, we demonstrate parallel writing capabilities by employing multi nano-tip probes. By using these methods we can drastically enhance the attractiveness of calixarene molecular resist as development-less, high resolution resist material for Scanning Probe Lithography (SPL).

Paper Details

Date Published: 21 March 2012
PDF: 9 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231G (21 March 2012); doi: 10.1117/12.916263
Show Author Affiliations
M. Kaestner, Ilmenau Univ. of Technology (Germany)
I. W. Rangelow, Ilmenau Univ. of Technology (Germany)


Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

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