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Proceedings Paper

High overlay accuracy for double patterning using an immersion scanner
Author(s): Yuji Shiba; Katsushi Makino; Yasuhiro Morita; Chihaya Motoyoshi; Hajime Yamamoto; Jin Udagawa; Takahisa Kikuchi; Yosuke Shirata; Yuuki Ishii
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Paper Abstract

Double patterning (DP) is widely regarded as the lithography solution for 32 nm half pitch semiconductor manufacturing, and DP will be the most likely litho technology for the 22 nm node [1]. When using the DP technique, overlay accuracy and CD control are of critical importance [2]. We previously introduced the NSR-S620D immersion scanner, which provides 2 nm overlay capabilities. In the case of the latest generation NSR-S621D system, improvements have been developed for further overlay accuracy enhancement. In this paper, we will show the overlay accuracy and Mix-and-Match performance of the NSR-S621D. Further, the marked improvement in product overlay and the overlay result in Spacer DP as a result of enhanced alignment accuracy will also be shown.

Paper Details

Date Published: 13 March 2012
PDF: 11 pages
Proc. SPIE 8326, Optical Microlithography XXV, 83260T (13 March 2012); doi: 10.1117/12.916246
Show Author Affiliations
Yuji Shiba, Nikon Corp. (Japan)
Katsushi Makino, Nikon Corp. (Japan)
Yasuhiro Morita, Nikon Corp. (Japan)
Chihaya Motoyoshi, Nikon Corp. (Japan)
Hajime Yamamoto, Nikon Corp. (Japan)
Jin Udagawa, Nikon Corp. (Japan)
Takahisa Kikuchi, Nikon Corp. (Japan)
Yosuke Shirata, Nikon Corp. (Japan)
Yuuki Ishii, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 8326:
Optical Microlithography XXV
Will Conley, Editor(s)

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