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Proceedings Paper

EUV OPC for the 20-nm node and beyond
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Paper Abstract

Although the k1 factor is large for extreme ultraviolet (EUV) lithography compared to deep ultraviolet (DUV) lithography, OPC is still needed to print the intended patterns on the wafer. This is primarily because of new non-idealities, related to the inability of materials to absorb, reflect, or refract light well at 13.5nm, which must be corrected by OPC. So, for EUV, OPC is much more than conventional optical proximity correction. This work will focus on EUV OPC error sources in the context of an EUV OPC specific error budget for future technology nodes. The three error sources considered in this paper are flare, horizontal and vertical print differences, and mask writing errors. The OPC flow and computation requirements of EUV OPC are analyzed as well and compared to DUV. Conventional optical proximity correction is simpler and faster for EUV compared to DUV because of the larger k1 factor. But, flare and H-V biasing make exploitation of design hierarchy more difficult.

Paper Details

Date Published: 23 March 2012
PDF: 14 pages
Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 83221M (23 March 2012); doi: 10.1117/12.916171
Show Author Affiliations
Chris H. Clifford, GLOBALFOUNDRIES Inc. (United States)
Yi Zou, GLOBALFOUNDRIES Inc. (United States)
Azat Latypov, GLOBALFOUNDRIES Inc. (United States)
Oleg Kritsun, GLOBALFOUNDRIES Inc. (United States)
Thomas Wallow, GLOBALFOUNDRIES Inc. (United States)
Harry J. Levinson, GLOBALFOUNDRIES Inc. (United States)
Fan Jiang, GLOBALFOUNDRIES Inc. (United States)
Deniz Civay, GLOBALFOUNDRIES Inc. (United States)
Keith Standiford, GLOBALFOUNDRIES Inc. (United States)
Ralph Schlief, GLOBALFOUNDRIES Inc. (United States)
Lei Sun, GLOBALFOUNDRIES Inc. (United States)
Obert R. Wood, GLOBALFOUNDRIES Inc. (United States)
Sudhar Raghunathan, GLOBALFOUNDRIES Inc. (United States)
Pawitter Mangat, GLOBALFOUNDRIES Inc. (United States)
Hui Peng Koh, GLOBALFOUNDRIES Inc. (United States)
Craig Higgins, GLOBALFOUNDRIES Inc. (United States)
Jeffrey Schefske, GLOBALFOUNDRIES Inc. (United States)
Mandeep Singh, GLOBALFOUNDRIES Inc. (Belgium)


Published in SPIE Proceedings Vol. 8322:
Extreme Ultraviolet (EUV) Lithography III
Patrick P. Naulleau; Obert R. Wood, Editor(s)

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