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Proceedings Paper

Demonstration of an effective flexible mask optimization (FMO) flow
Author(s): Charlotte Beylier; Nicolas Martin; Vincent Farys; Franck Foussadier; Emek Yesilada; Frederic Robert; Stanislas Baron; Russell Dover; Hua-yu Liu
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Paper Abstract

The 2x nm generation of advanced designs presents a major lithography challenge to achieve adequate correction due to the very low k1 values. The burden thus falls on resolution enhancement techniques (RET) in order to be able to achieve enough image contrast, with much of this falling to computational lithography. Advanced mask correction techniques can be computationally expensive. This paper presents a methodology that enables advanced mask quality with the cost of much simpler methods. Brion Technologies has developed a product called Flexible Mask Optimization (FMO) which identifies hotspots, applies an advanced technique to improve them, performs model based boundary healing to reinsert the repaired hotspot cleanly (without introducing new hotspots), and then performs a final verification. STMicroelectronics has partnered with Brion to evaluate and prove out the capability and performance of this approach. The results shown demonstrate improved performance on 2x nm node complex 2D hole layers using a hybrid approach of rule based sub resolution assist features (RB-SRAF) and model based SRAF (MB-SRAF). The effective outcome is to achieve MB-SRAF levels of quality but at only a slightly higher computational cost than a quick, cheap rule based approach.

Paper Details

Date Published: 13 March 2012
PDF: 8 pages
Proc. SPIE 8326, Optical Microlithography XXV, 832616 (13 March 2012); doi: 10.1117/12.916168
Show Author Affiliations
Charlotte Beylier, STMicroelectronics (France)
Nicolas Martin, Brion Technologies, Inc. (United States)
Vincent Farys, STMicroelectronics (France)
Franck Foussadier, STMicroelectronics (France)
Emek Yesilada, STMicroelectronics (France)
Frederic Robert, STMicroelectronics (France)
Stanislas Baron, Brion Technologies, Inc. (United States)
Russell Dover, Brion Technologies, Inc. (United States)
Hua-yu Liu, Brion Technologies, Inc. (United States)

Published in SPIE Proceedings Vol. 8326:
Optical Microlithography XXV
Will Conley, Editor(s)

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