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Proceedings Paper

Investigation of correlation with the octanol water partition coefficient and the sensitivity of negative-tone molecular resists
Author(s): Masatoshi Echigo; Masako Yamakawa; Yumi Ochiai; Yu Okada; Masaaki Takasuka
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Paper Abstract

In this paper, we report the investigation of correlation with the octanol water partition coefficient and the sensitivity of negative-tone molecular resists based on calix[4]resorcinarene (CRA) by Electron Beam Lithography (EBL). The sensitivity of negative-tone molecular resists were higher as the value of the Octanol water partition coefficient got smaller. It was confirmed that the octanol water partition coefficient was useful to the guess of sensitivity of negativetone molecular resists. Furthermore, we have developed calix[4]resorcinarenes showing well-defined sub 20nm halfpitch patterns.

Paper Details

Date Published: 19 March 2012
PDF: 8 pages
Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83251G (19 March 2012); doi: 10.1117/12.916145
Show Author Affiliations
Masatoshi Echigo, Mitsubishi Gas Chemical Co., Inc. (Japan)
Masako Yamakawa, Mitsubishi Gas Chemical Co., Inc. (Japan)
Yumi Ochiai, Mitsubishi Gas Chemical Co., Inc. (Japan)
Yu Okada, Mitsubishi Gas Chemical Co., Inc. (Japan)
Masaaki Takasuka, Mitsubishi Gas Chemical Co., Inc. (Japan)


Published in SPIE Proceedings Vol. 8325:
Advances in Resist Materials and Processing Technology XXIX
Mark H. Somervell; Thomas I. Wallow, Editor(s)

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