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Proceedings Paper

A phase segregating polymer blend for 2xnm feature applications
Author(s): Jin Li; Tatsuro Nagahara; Munirathna Padmanaban; John Sagan
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Paper Abstract

A phase segregating polymer blend comprising a SOD precursor polysilazane and an organic polymer PSαMS [poly(styrene-co-α-methyl styrene)] was studied. By utilizing similar approaches employed in DSA (directed self-assembly) such as patterned substrates, surface chemical modification etc and their combination, we achieved 2xnm spacer and airgap-like structure. Vertical phase separation and cylinder microdomains in the film of this blend can be straightforwardly observed by cross-section SEM (Scanning Electron Microscope) respectively. The airgap-like structure derived from cylinder microdomains was directly obtained on ArF resist pattern. Spacer derived from vertical phase separation was obtained on pretreated ArF resist pattern.

Paper Details

Date Published: 21 March 2012
PDF: 10 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231R (21 March 2012); doi: 10.1117/12.916031
Show Author Affiliations
Jin Li, AZ Electronic Materials K.K. (Japan)
Tatsuro Nagahara, AZ Electronic Materials K.K. (Japan)
Munirathna Padmanaban, AZ Electronic Materials USA Corp. (United States)
John Sagan, AZ Electronic Materials USA Corp. (United States)

Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

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