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Proceedings Paper

Solvent pre-wetting as an effective start-up method for point-of-use filter
Author(s): Toru Umeda; Shinichi Sugiyama; Takashi Nakamura; Makoto Momota; Michael Sevegney; Shuichi Tsuzuki; Toru Numaguchi
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Paper Abstract

An effective filter start-up method has been required by device manufacturers, mainly in order to reduce waste volume of lithography process chemicals, which become more expensive as lithography technology advances. Remaining air was monitored during static-pressure-driven filter start-up. As a result, 3500 ml of the resist was needed to eliminate remaining air. For improvement, cyclohexanone pre-wetting was applied prior to the resist introduction. As a result, the resist volume needed for the solvent displacement was 1900 ml, approximately half the volume required for staticpressure- driven start-up. Other solvents were evaluated for the pre-wetting start-up method. Results, in descending order of performance were PGME (best) < PGMEA = IPA < cyclohexanone (worst). Moreover, air displacement performance strongly correlated with Hansen solubility parameter distance between each solvent and nylon 6,6 material.

Paper Details

Date Published: 19 March 2012
PDF: 8 pages
Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83252H (19 March 2012); doi: 10.1117/12.916026
Show Author Affiliations
Toru Umeda, Nihon Pall Ltd. (Japan)
Shinichi Sugiyama, FUJIFILM Corp. (Japan)
Takashi Nakamura, FUJIFILM Corp. (Japan)
Makoto Momota, FUJIFILM Corp. (Japan)
Michael Sevegney, Pall Corp. (United States)
Shuichi Tsuzuki, Nihon Pall Ltd. (Japan)
Toru Numaguchi, Nihon Pall Ltd. (Japan)


Published in SPIE Proceedings Vol. 8325:
Advances in Resist Materials and Processing Technology XXIX
Mark H. Somervell; Thomas I. Wallow, Editor(s)

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