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Proceedings Paper

Computational study of line tip printability of sub-20-nm technology
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Paper Abstract

This paper illustrates the increasing importance of line tip printing as measured by the size of the weak line tip zone for sub-20nm technology. This paper suggests adding line tip printability into sub-20nm lithography performance metric in addition to the conventional tip-to-tip resolution. This study shows that these two metrics sometimes respond to lithography conditions inversely. The importance of including line tip printability into technology evaluation is demonstrated by comparing LELE optical lithography and EUV lithography. Also, line tip printing with EUV lithography is explored with various illumination conditions and resist developer tones.

Paper Details

Date Published: 23 March 2012
PDF: 9 pages
Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 832229 (23 March 2012); doi: 10.1117/12.915868
Show Author Affiliations
Lei Yuan, GLOBALFOUNDRIES Inc. (United States)
Thomas Wallow, GLOBALFOUNDRIES Inc. (United States)
Deniz Civay, GLOBALFOUNDRIES Inc. (United States)
Linus Jang, GLOBALFOUNDRIES Inc. (United States)
Jongwook Kye, GLOBALFOUNDRIES Inc. (United States)
Harry Levinson, GLOBALFOUNDRIES Inc. (United States)
Sohan Singh, GLOBALFOUNDRIES Inc. (United States)
Mark Kelling, GLOBALFOUNDRIES Inc. (United States)


Published in SPIE Proceedings Vol. 8322:
Extreme Ultraviolet (EUV) Lithography III
Patrick P. Naulleau; Obert R. Wood, Editor(s)

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