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Proceedings Paper

Laser processes for future solar cells
Author(s): Andreas Letsch; Dominik Bartl; Michael Diez; Roland Gauch; Andreas Michalowski; Margit Hafner
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Paper Abstract

The photovoltaic (PV) industry requires higher efficiencies at lower manufacturing costs to become competitive with other power generation techniques. There are several approaches to increase the efficiency of solar cells. For example enhancements of the way photons are absorbed and how they generate charge carriers with low losses. Today, the so called first generation of photovoltaic devices based on crystalline silicon wafers are produced on a multi-GW-level. However, in most production lines there is only one laser process used to electrically isolate front and rear side of the cell. Lasers are predestined to generate local structures which will be required to manufacture high efficient solar cells. As an example we will show results on the interaction of ultra short laser pulses with dielectric films on silicon. Second generation photovoltaic modules are based on thin films. These modules are monolithically interconnected by laser scribing of the films. Tools for amorphous silicon are well established, while there are a lot of challenges to scribe CIGS layers. Within this paper we will show new results on the temporal evolution of a laser induced "lift-off" process to scribe the molybdenum back electrode.

Paper Details

Date Published: 15 February 2012
PDF: 16 pages
Proc. SPIE 8243, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XVII, 824317 (15 February 2012); doi: 10.1117/12.915771
Show Author Affiliations
Andreas Letsch, Robert Bosch GmbH (Germany)
Dominik Bartl, Robert Bosch GmbH (Germany)
Michael Diez, Robert Bosch GmbH (Germany)
Roland Gauch, Robert Bosch GmbH (Germany)
Andreas Michalowski, Robert Bosch GmbH (Germany)
Margit Hafner, Univ. of Stuttgart (Germany)

Published in SPIE Proceedings Vol. 8243:
Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XVII
Guido Hennig; Xianfan Xu; Bo Gu; Yoshiki Nakata, Editor(s)

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