We studied the ionization of polymer for extreme ultraviolet (EUV) resist. Quantum chemical calculation was performed. Upon EUV exposure to the polymer in a resist, the ionization of the polymer occurs and the secondary electrons generate. As the secondary electrons from the polymer cause the reaction of photoacid generator and the photoacid generates, the ionization of the polymer is a key for the sensitivity of resist for EUV. In this paper, the structural effects of polymer ionization was investigated. The acryl polymers with various pendant groups were compared. It was found that the stable condition of radical cation helps the ionization of the polymer.

Date Published: 19 March 2012
PDF: 9 pages
Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83251F (19 March 2012); doi: 10.1117/12.915696

Published in SPIE Proceedings Vol. 8325:
Advances in Resist Materials and Processing Technology XXIX
Mark H. Somervell; Thomas I. Wallow, Editor(s)