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Proceedings Paper

Predictable turn-around time for post tape-out flow
Author(s): Toshikazu Endo; Minyoung Park; Pradiptya Ghosh
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Paper Abstract

A typical post-out flow data path at the IC Fabrication has following major components of software based processing - Boolean operations before the application of resolution enhancement techniques (RET) and optical proximity correctin (OPC), the RET and OPC step [etch retargeting, sub-resolution assist feature insertion (SRAF) and OPC], post-OPCRET Boolean operations and sometimes in the same flow simulation based verification. There are two objectives that an IC Fabrication tapeout flow manager wants to achieve with the flow - predictable completion time and fastest turn-around time (TAT). At times they may be competing. There have been studies in the literature modeling the turnaround time from historical data for runs with the same recipe and later using that to derive the resource allocation for subsequent runs. [3]. This approach is more feasible in predominantly simulation dominated tools but for edge operation dominated flow it may not be possible especially if some processing acceleration methods like pattern matching or hierarchical processing is involved. In this paper, we suggest an alternative method of providing target turnaround time and managing the priority of jobs while not doing any upfront resource modeling and resource planning. The methodology then systematically either meets the turnaround time need and potentially lets the user know if it will not as soon as possible. This builds on top of the Calibre Cluster Management (CalCM) resource management work previously published [1][2]. The paper describes the initial demonstration of the concept.

Paper Details

Date Published: 13 March 2012
PDF: 14 pages
Proc. SPIE 8326, Optical Microlithography XXV, 83262D (13 March 2012); doi: 10.1117/12.913986
Show Author Affiliations
Toshikazu Endo, Mentor Graphics Corp. (United States)
Minyoung Park, Mentor Graphics Corp. (United States)
Pradiptya Ghosh, Mentor Graphics Corp. (United States)

Published in SPIE Proceedings Vol. 8326:
Optical Microlithography XXV
Will Conley, Editor(s)

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