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Proceedings Paper

Elucidating the kinetics and mechanism of RAPID lithography
Author(s): Michael P. Stocker; John T. Fourkas
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Paper Abstract

Multiphoton absorption polymerization (MAP) is a powerful photolithographic technique that is capable of producing complex, three-dimensional structures. One key to improving the resolution of MAP is to employ photoinitiators that can be photodeactivated. This approach is known as resolution augmentation through photo-induced deactivation (RAPID). To enhance the efficiency and resolution of RAPID, it is necessary to develop a deeper understanding of the photochemistry of the molecules used to initiate polymerization. To study the nature of the active intermediate species capable of self-deactivation, here we present experiments in which the exposure and the timing of excitation and deactivation are varied for photopolymerization reactions occurring at a single location within a photoresist as well as experiments in which the dependence of feature size on fabrication velocity is determined.

Paper Details

Date Published: 8 February 2012
PDF: 7 pages
Proc. SPIE 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V, 824902 (8 February 2012); doi: 10.1117/12.912944
Show Author Affiliations
Michael P. Stocker, Univ. of Maryland, College Park (United States)
John T. Fourkas, Univ. of Maryland, College Park (United States)


Published in SPIE Proceedings Vol. 8249:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V
Winston V. Schoenfeld; Raymond C. Rumpf; Georg von Freymann, Editor(s)

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