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Proceedings Paper

Contact-hole patterning for random logic circuits using block copolymer directed self-assembly
Author(s): He Yi; Xin-Yu Bao; Jie Zhang; Richard Tiberio; James Conway; Li-Wen Chang; Subhasish Mitra; H.-S. Philip Wong
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Paper Abstract

Block copolymer directed self-assembly (DSA) is a promising extension of optical lithography for device fabrication akin to double-patterning. The irregular distribution of contact holes in circuit layouts is one of the biggest challenges for DSA patterning because the self-assembly tends to form regular patterns naturally. Although the small guiding templates are shown to guide the self-assembly off the natural geometry by strong boundary confinement [1, 2] (Fig. 1), it is insufficient to simply surround contact holes with guiding templates without optimizing the placement and geometry of the guiding templates.

Paper Details

Date Published: 21 March 2012
PDF: 6 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83230W (21 March 2012); doi: 10.1117/12.912804
Show Author Affiliations
He Yi, Stanford Univ. (United States)
Xin-Yu Bao, Stanford Univ. (United States)
Jie Zhang, Stanford Univ. (United States)
Richard Tiberio, Stanford Univ. (United States)
James Conway, Stanford Univ. (United States)
Li-Wen Chang, Stanford Univ. (United States)
Subhasish Mitra, Stanford Univ. (United States)
H.-S. Philip Wong, Stanford Univ. (United States)

Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

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