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Proceedings Paper

Modeling and simulation of the surface profile forming process for optimum control of the lithographically fabricated microlenses and lens arrays
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Paper Abstract

Numerical tools have been widely used in the simulations of the exposure, the post-exposure bake, and the development processes in lithography of thick photoresist. Three-dimensional (3D) cellular automata (CA) model has also been successfully introduced for resist etching process simulation in recent years. In this paper, we report a 3D CA model to simulate the formation process of the surface profile of out-of-plane microlens fabricated using ultraviolet (UV) lithography of thick SU-8 resist. The simulation results were compared with experimental results. The comparison shows that the 3D CA model can be used to simulate the complicated surface formation process of the microlenses during the development process.

Paper Details

Date Published: 15 February 2012
PDF: 6 pages
Proc. SPIE 8252, MOEMS and Miniaturized Systems XI, 82520R (15 February 2012); doi: 10.1117/12.912520
Show Author Affiliations
Zhengyu Miao, Louisiana State Univ. (United States)
Wanjun Wang, Louisiana State Univ. (United States)


Published in SPIE Proceedings Vol. 8252:
MOEMS and Miniaturized Systems XI
Harald Schenk; Wibool Piyawattanametha; Wilfried Noell, Editor(s)

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