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Proceedings Paper

Investigation of laser-induced damage threshold of hafnia/silica high reflectors at 1064 nm
Author(s): Wanjun Ai; Shengming Xiong
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Paper Abstract

HfO2 single layers and HfO2/SiO2 high reflectors with standard 1/4 wavelength design were prepared by ion assisted deposition (IAD) with APS ion source and ion beam sputtering (IBS). Characterization of HfO2 single layers such as structural and optical properties, surface topography and absorption have been studied. The laser-induced damage thresholds (LIDTs) of the high reflectors with different multilayer stacks at 1064nm were tested with S-on-1 testing mode according to ISO-11254. In addition, optical properties, surface topography and absorption of these testing high reflectors have also been investigated in our experiments. All the results used to analyze the LIDTs of high reflectors have been discussed and interpreted in literature.

Paper Details

Date Published: 12 January 2012
PDF: 7 pages
Proc. SPIE 8206, Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers, 82060G (12 January 2012); doi: 10.1117/12.910464
Show Author Affiliations
Wanjun Ai, Institute of Optics and Electronics (China)
Graduate School of the Chinese Academy of Sciences (China)
Shengming Xiong, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 8206:
Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers
Jianda Shao, Editor(s)

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