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Proceedings Paper

Laser-induced fluorescence of fused silica irradiated by ArF excimer laser
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Paper Abstract

Laser-induced fluorescence (LIF) of high-purity fused silica irradiated by ArF excimer laser is studied experimentally. LIF bands of the fused silica centered at 281nm, 478nm and 650nm are observed simultaneously. Furthermore, the angular distribution of the three fluorescence peaks is examined. Microscopic image of the laser modified fused silica indicates that scattering of the generated fluorescence by laser-induced damage sites is the main reason for the angular distribution of LIF signals. Finally, the dependence of LIF signals intensities of the fused silica on laser power densities is presented. LIF signals show a squared power density dependence, which indicates that laser-induced defects are formed mainly via two-photon absorption processes.

Paper Details

Date Published: 12 January 2012
PDF: 13 pages
Proc. SPIE 8206, Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers, 820607 (12 January 2012); doi: 10.1117/12.910377
Show Author Affiliations
Qihong Lou, Shanghai Institute of Optics and Fine Mechanics (China)
Haibo Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Zhijun Yuan, Shanghai Institute of Optics and Fine Mechanics (China)
Jun Zhou, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 8206:
Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers
Jianda Shao, Editor(s)

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