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Proceedings Paper

Research for ultra-short pulse ablation of dielectric film mirror
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Paper Abstract

In high-power laser system, in order to extend the components' service life and reduce the operation costs, more attentions should be pay at the research for damages ablation at multi-layer optical components and other high load optical components. 240ps, 35ps, 6ps 1053nm laser pulses has been used to investigate damage ablation and damage resistant experiments at 0° high reflection films. By comparing the damage morphology and damage resistant threshold of the ablation pits at different pulses width, it was superior to use ultra-short pulse to repair multi-layers optical components. It was found that the shorter pulse width has been used, the higher the damage resistant threshold and the lower the laser modulation. Furthermore, the finite-difference time-domain method was used to simulate the electric-field intensification within the large size damage region of multilayer films.

Paper Details

Date Published: 12 January 2012
PDF: 9 pages
Proc. SPIE 8206, Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers, 82060V (12 January 2012); doi: 10.1117/12.910257
Show Author Affiliations
Zhimin Xiong, Shanghai Institute of Optics and Fine Mechanics (China)
Panzheng Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Youen Jiang, Shanghai Institute of Optics and Fine Mechanics (China)
Xiaochao Wang, Shanghai Institute of Optics and Fine Mechanics (China)
Dajie Huang, Shanghai Institute of Optics and Fine Mechanics (China)
Wei Fan, Shanghai Institute of Optics and Fine Mechanics (China)
Xuechun Li, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 8206:
Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers
Jianda Shao, Editor(s)

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