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Proceedings Paper

Rolling mask nanolithography: the pathway to large area and low cost nanofabrication
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Paper Abstract

The demand for large area and low cost nanopatterning techniques for optical coatings and photonic devices has increased at a tremendous rate. At present, it is clear that currently available nanopatterning technologies are unable to meet the required performance, fabrication-speed, or cost criteria for many applications requiring large area and low cost nanopatterning. Rolith Inc proposes to use a new nanolithography method - "Rolling mask" lithography - that combines the best features of photolithography, soft lithography and roll-to-plate printing technologies. We will report on the first results achieved on a recently built prototype tool and cylindrical mask, which was designed to pattern 300 mm wide substrate areas.

Paper Details

Date Published: 8 February 2012
PDF: 11 pages
Proc. SPIE 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V, 82490O (8 February 2012); doi: 10.1117/12.910158
Show Author Affiliations
Boris Kobrin, Rolith, Inc. (United States)
Edward S. Barnard, Rolith, Inc. (United States)
Mark L. Brongersma, Rolith, Inc. (United States)
Moon Kyu Kwak, Univ. of Michigan (United States)
L. Jay Guo, Univ. of Michigan (United States)

Published in SPIE Proceedings Vol. 8249:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V
Winston V. Schoenfeld; Raymond C. Rumpf; Georg von Freymann, Editor(s)

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