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Proceedings Paper

Laser plasma effects on surface damage characteristics of silicon
Author(s): Jinghua Han; Weixing Fan; Yaguo Li; Liming Yang; Guoying Feng; Xiang Gao; Yanyan Liu; Lingdong Bao; Yongzhong Huang
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Paper Abstract

Silicon is a key material to electro-photonic detectors, which makes the studies of laser induced damage of silicon significantly important in laser detecting and military applications. The damage characters of silicon under high-intensity nanosecond laser pulses have been investigated in this paper. The results show that the synergy of thermal, shock and spectral radiation effects of laser plasma determines the damage characters in silicon. Due to thermal and shock effects of laser plasma, the material is melt, vaporized, ionized and pushed out in laser irradiated area. This way, pits are formed and the cool ejected effluents are distributed radially. The interference between scattered and incident laser can form a periodic structure because of the periodic distribution of thermal stress in particular area. N, O and Si characteristic spectrum in laser plasma suggests that colored film is the mixture of SiOx:SiNy from laser plasma under repetitive laser pulses.

Paper Details

Date Published: 12 January 2012
PDF: 7 pages
Proc. SPIE 8206, Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers, 820616 (12 January 2012); doi: 10.1117/12.910071
Show Author Affiliations
Jinghua Han, Sichuan Univ. (China)
Weixing Fan, Sichuan Univ. (China)
Optimal Coatech Corp. Ltd. (China)
Yaguo Li, Fine Optical Engineering Research Ctr. (China)
Liming Yang, Fine Optical Engineering Research Ctr. (China)
Guoying Feng, Sichuan Univ. (China)
Xiang Gao, Sichuan Univ. (China)
Yanyan Liu, Sichuan Univ. (China)
Lingdong Bao, Sichuan Univ. (China)
Yongzhong Huang, Sichuan Univ. (China)

Published in SPIE Proceedings Vol. 8206:
Pacific Rim Laser Damage 2011: Optical Materials for High Power Lasers
Jianda Shao, Editor(s)

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