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Proceedings Paper

Fabrication of the multi-level phase type hologram for display using the laser direct write lithography system
Author(s): Seiji Nakano; Sumio Nakahara; Shoso Singubara
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Paper Abstract

Recently, the demand to the diffractive optical element (DOE) is increasing with the developments in the technology. We created a relative large holographic optical element (HOE) with same course of production of the DOE. To make the person who is situated on the long distance recognize image data using the hologram, the hologram must have bright image reconstruction ability and a high SN ratio. Therefore, we made the multi-level phase type hologram for the former and measured the optical intensity of the reproduction image. For an evaluation method of the diffraction efficiency, we used 2-, 4-, and 8-level phase type Fresnel Zone Plate (FZP). Because it supposed that the amount of object was large, it adopted a computer-generated hologram (CGH). Also, it used laser direct write lithography system that has the feature of high-resolution drawing, high-speed drawing, and a high accuracy positioning system, for the making of hologram.

Paper Details

Date Published: 9 February 2012
PDF: 6 pages
Proc. SPIE 8281, Practical Holography XXVI: Materials and Applications, 828116 (9 February 2012); doi: 10.1117/12.909826
Show Author Affiliations
Seiji Nakano, Kansai Univ. (Japan)
Sumio Nakahara, Kansai Univ. (Japan)
Shoso Singubara, Kansai Univ. (Japan)

Published in SPIE Proceedings Vol. 8281:
Practical Holography XXVI: Materials and Applications
Hans I. Bjelkhagen; V. Michael Bove Jr., Editor(s)

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