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Proceedings Paper

Submicrometer pattern generation by diffractive mask-aligner lithography
Author(s): Uwe D. Zeitner; Lorenz Stuerzebecher; Torsten Harzendorf; Frank Fuchs; Dirk Michaelis
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Paper Abstract

A novel technique for the fabrication of high resolution sub-micrometer patterns by diffractive proximity lithography in a mask-aligner is presented. The technique is based on the use of specially designed diffractive photo-masks. It requires some small modifications of the mask-aligner, especially for the mask illumination and the settings of the proximity gap between mask and substrate. The huge potential of this novel technique is demonstrated at the example of structures having lateral feature sizes in the sub-500nm range printed with mask-to-substrate distances of several ten micrometers.

Paper Details

Date Published: 15 February 2012
PDF: 7 pages
Proc. SPIE 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V, 82490Q (15 February 2012); doi: 10.1117/12.909806
Show Author Affiliations
Uwe D. Zeitner, Friedrich-Schiller-Univ. Jena (Germany)
Fraunhofer Institute of Applied Optics and Precision Engineering (Germany)
Lorenz Stuerzebecher, Friedrich-Schiller-Univ. Jena (Germany)
Torsten Harzendorf, Fraunhofer Institute of Applied Optics and Precision Engineering (Germany)
Frank Fuchs, Fraunhofer Institute of Applied Optics and Precision Engineering (Germany)
Dirk Michaelis, Fraunhofer Institute of Applied Optics and Precision Engineering (Germany)


Published in SPIE Proceedings Vol. 8249:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V
Winston V. Schoenfeld; Raymond C. Rumpf; Georg von Freymann, Editor(s)

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