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Proceedings Paper

Photoresist roughness characterization in additive lithography processes for the fabrication of phase-only optical vortices
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Paper Abstract

The roughness on the surface of phase-only micro-optical elements can limit their performance. An optical vortex phase element was fabricated by using additive lithography with an optimized process to have minimal surface roughness. Thick photoresist was used in order to obtain the appropriate dynamic range for the desired phase profile. We investigated the effects of both post applied and post exposure baking processes, as well as the effects of surfactant in the developer. We found the resist surface roughness to be a function of both the temperature and the time of the respective bakes, as well as the developer surfactant content.

Paper Details

Date Published: 15 February 2012
PDF: 6 pages
Proc. SPIE 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V, 82491M (15 February 2012); doi: 10.1117/12.909719
Show Author Affiliations
Zahra Hosseinimakarem, The Univ. of North Carolina at Charlotte (United States)
Menelaos K. Poutous, The Univ. of North Carolina at Charlotte (United States)
Eric G. Johnson, Clemson Univ. (United States)


Published in SPIE Proceedings Vol. 8249:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V
Winston V. Schoenfeld; Raymond C. Rumpf; Georg von Freymann, Editor(s)

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