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Proceedings Paper

Aberration correction for improving the performance of a DMHL system
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Paper Abstract

Dynamic maskless holographic lithography (DMHL) is a new micro-manufacturing technique that has no moving parts. The laser light used for patterning is directed in all three dimensions with a hologram displayed on a liquid-crystal spatial light modulator (SLM). Optical aberrations, like spherical aberration due to refractive index mismatch between the photoresist and the immersion oil of the high-NA objective or astigmatism due to the deformations in the surface of the SLM, can degrade the performance of the system. Degraded performance includes a decrease in potential patterning volume and pattern fidelity and an increase in patterning time. This paper presents a way to correct for these aberrations using Zernike polynomials. The optimal Zernike coefficients are found by maximizing a sharpness metric. The effect of aberration correction on the DMHL process is quantified by measuring the patterning volume. DMHL manufactured features made with this aberration correction method show a marked improvement over features made without correction. It is even possible to correct for misaligned optics with this method.

Paper Details

Date Published: 15 February 2012
PDF: 9 pages
Proc. SPIE 8253, MEMS Adaptive Optics VI, 82530O (15 February 2012); doi: 10.1117/12.908984
Show Author Affiliations
Daniel R. McAdams, Univ. of Pittsburgh (United States)
Daniel G. Cole, Univ. of Pittsburgh (United States)

Published in SPIE Proceedings Vol. 8253:
MEMS Adaptive Optics VI
Scot S. Olivier; Thomas G. Bifano; Joel Kubby, Editor(s)

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