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Proceedings Paper

Fabrication and characterization of parallel-coupled dual racetrack silicon microresonators
Author(s): Ryan A. Integlia; Lianghong Yin; Duo Ding; David Z. Pan; Douglas M. Gill; Weiwei Song; Ying Qian; Wei Jiang
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Paper Abstract

Parallel-coupled dual racetrack micro-resonator structures have potential applications for quadrature amplitude modulation. Fabrication of parallel-coupled dual racetrack silicon micro-resonators was conducted, while overcoming for some barriers to fabrication. Fabrication process limitations and design considerations are discussed. Fabrication results are presented. Some barriers to fabrication include stitching and overdosing in electron beam lithography. A multi-input and output test bed with optical and electrical control was necessary for device characterization. The characterization of the fabricated devices is presented, along with the related procedures. Some of the tests performed are wavelength scans and top surface scans.

Paper Details

Date Published: 23 February 2012
PDF: 5 pages
Proc. SPIE 8266, Silicon Photonics VII, 82660M (23 February 2012); doi: 10.1117/12.908601
Show Author Affiliations
Ryan A. Integlia, Rutgers, The State Univ. of New Jersey (United States)
Lianghong Yin, Rutgers, The State Univ. of New Jersey (United States)
Duo Ding, The Univ. of Texas at Austin (United States)
David Z. Pan, The Univ. of Texas at Austin (United States)
Douglas M. Gill, Alcatel-Lucent Bell Labs. (United States)
Weiwei Song, Rutgers, The State Univ. of New Jersey (United States)
Ying Qian, Rutgers, The State Univ. of New Jersey (United States)
Jilin Univ. (China)
Wei Jiang, Rutgers, The State Univ. of New Jersey (United States)


Published in SPIE Proceedings Vol. 8266:
Silicon Photonics VII
Joel Kubby; Graham Trevor Reed, Editor(s)

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