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Proceedings Paper

Tuning the reflectivity of high-contrast gratings based on silicon and silica by means of wet etching with hydrofluoric acid
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Paper Abstract

We report on experimental etching techniques to trim the efficiency of high-contrast gratings based on silicon and silica. We show that the resonance wavelength and hence the reflectivity can be tuned by means of selectively etching the silica grating. In order to realize a well-defined adjustment of the grating profiles the etching rates of silica layers with hydrofluoric acid were determined. Coatings deposited by different techniques such as electron-beam evaporation, ion plating and thermal oxidation are compared and the influence of structuration on the etching is investigated, as well. This work basically helps to improve the maximum reflectivity that can be realized with these high-contrast reflectors and tune the resonance to a required wavelength.

Paper Details

Date Published: 23 February 2012
PDF: 6 pages
Proc. SPIE 8270, High Contrast Metastructures, 82700U (23 February 2012); doi: 10.1117/12.908240
Show Author Affiliations
Tassilo Jacobitz, Institute of Applied Physics, Abbe Ctr. of Photonics, Friedrich-Schiller-Univ. Jena (Germany)
Stefanie Kroker, Institute of Applied Physics, Abbe Ctr. of Photonics, Friedrich-Schiller-Univ. Jena (Germany)
Thomas Käsebier, Institute of Applied Physics, Abbe Ctr. of Photonics, Friedrich-Schiller-Univ. Jena (Germany)
Ernst-Bernhard Kley, Institute of Applied Physics, Abbe Ctr. of Photonics, Friedrich-Schiller-Univ. Jena (Germany)
Andreas Tünnermann, Institute of Applied Physics, Abbe Ctr. of Photonics, Friedrich-Schiller-Univ. Jena (Germany)
Fraunhofer Institute of Applied Optics and Precision Engineering (Germany)


Published in SPIE Proceedings Vol. 8270:
High Contrast Metastructures
Connie J. Chang-Hasnain; Fumio Koyama; Alan Eli Willner; Weimin Zhou, Editor(s)

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