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Proceedings Paper

High-throughput process parallelization for laser surface modification on Si-solar cells: determination of the process window
Author(s): Viktor Schütz; Alexander Horn; Uwe Stute
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Paper Abstract

The laser is an extremely suitable non-contact tool for fast and automated in-line processes for example used to improve the efficiency of solar cells. With ultra-short pulsed laser radiation it is possible to decrease the reflectivity by modifying the surface topology of silicon. For the proposed modification, the optimum process window for altering the silicon surface topology on a micrometer scale is found at small laser fluencies at finite repetition rates. A promising up scaling method is process parallelization using in parallel a multiple set of interaction zones with the optimized process characteristics for single process interaction. Based on the single process, required laser process parameters and optical parameters for parallel processing are derived theoretically in order to enable a wafer processing in standard cycle times. Exemplarily 5-inch mc-silicon solar wafers are machined using a linear 7-times diffractive optical element (DOE), and in a second step solar cells are built up to determine the efficiency gain by the laser surface modification. A preliminary absolute efficiency gain of Δη > 0.2 % is achieved.

Paper Details

Date Published: 25 February 2012
PDF: 7 pages
Proc. SPIE 8244, Laser-based Micro- and Nanopackaging and Assembly VI, 82440X (25 February 2012); doi: 10.1117/12.907972
Show Author Affiliations
Viktor Schütz, Laser Zentrum Hannover e.V. (Germany)
Alexander Horn, Laser Zentrum Hannover e.V. (Germany)
Uwe Stute, Laser Zentrum Hannover e.V. (Germany)


Published in SPIE Proceedings Vol. 8244:
Laser-based Micro- and Nanopackaging and Assembly VI
Friedrich G. Bachmann; Wilhelm Pfleging; Kunihiko Washio; Jun Amako; Willem Hoving; Yongfeng Lu, Editor(s)

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