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Proceedings Paper

Analysis of the vectorial diffraction characteristics of grating light modulators for MOEMS spectrometer
Author(s): Wei Wei; Yong Zhu; Ning Wang; Hao Mei
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Paper Abstract

Grating light modulators are the key wavelength scanning devices for a MOEMS spectrometer. In this paper, we build a vectorial diffraction model of grating light modulators theoretically based on Finite Beam Rigorous Coupled Wave Analysis theory. Then we calculate the diffraction efficiency of grating light modulators at the spectral range from 900nm to 1700nm. The numerical spectra indicate that the grating light modulators can realize wavelength scanning by changing the distance between the upper and the bottom layers. The grating light modulator can act as a programmable pixilated optical switch with high contrast. The diffraction efficiency is stable when the θ changes from -10 degrees to 10 degrees and the Φ changes from -30 degrees to 30 degrees. The effects of the bandwidth on the diffraction efficiency of the grating light modulators can be ignored. The average on state diffraction efficiency is 0.83 and the average off state diffraction efficiency is 0.05 when the grating light modulators chip has 256 pixels. The experimental results show that the vectorial diffraction model is more efficient than the scalar diffraction model.

Paper Details

Date Published: 30 November 2011
PDF: 10 pages
Proc. SPIE 8202, 2011 International Conference on Optical Instruments and Technology: Solid State Lighting and Display Technologies, Holography, Speckle Pattern Interferometry, and Micro/Nano Manufacturing and Metrology, 82020R (30 November 2011); doi: 10.1117/12.907338
Show Author Affiliations
Wei Wei, Chongqing Univ. (China)
Yong Zhu, Chongqing Univ. (China)
Ning Wang, Chongqing Univ. (China)
Hao Mei, Chongqing Univ. (China)


Published in SPIE Proceedings Vol. 8202:
2011 International Conference on Optical Instruments and Technology: Solid State Lighting and Display Technologies, Holography, Speckle Pattern Interferometry, and Micro/Nano Manufacturing and Metrology
Hoi Sing Kwok; Fengzhou Fang; Lian Xiang Yang; Chongxiu Yu; Albert A. Weckenmann; Yanbing Hou; Jinxue Wang; Ji Zhao; Jinxue Wang; Peter Zeppenfeld; Boyu Ding; Boyu Ding; Liquan Dong; Liquan Dong; Jack K. Luo; Boyu Ding; Liquan Dong; Jinxue Wang, Editor(s)

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