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Proceedings Paper

Monolithic fabrication and performance control of multilayered, polarization sensitive, guided-mode resonance filters
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Paper Abstract

An efficient monolithic fabrication technique of multiple Guided-Mode Resonance Filter (GMRF) devices on a single substrate is presented. The devices consist of two crossed linear sub-wavelength grating (SWG) dielectric layers, formed by etching deposited silicon oxide films, separated by a silicon nitride waveguide. The buried SWG duty cycle is lithographically modulated to control the device resonance wavelengths, independent of the top SWG. This is because the buried SWG acts as a tunable effective index layer, controlling the waveguide mode coupling wavelength into the silicon nitride waveguide layer. The two SWG have different spatial periods, to further reduce resonance coupling between them. The fabrication is accomplished using existing photolithographic technology, and conventional PECVD coating techniques.

Paper Details

Date Published: 8 February 2012
PDF: 7 pages
Proc. SPIE 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V, 82490D (8 February 2012); doi: 10.1117/12.906854
Show Author Affiliations
Menelaos K. Poutous, The Univ. of North Carolina at Charlotte (United States)
Indumathi Raghu Srimathi, Clemson Univ. (United States)
Eric G. Johnson, Clemson Univ. (United States)


Published in SPIE Proceedings Vol. 8249:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V
Winston V. Schoenfeld; Raymond C. Rumpf; Georg von Freymann, Editor(s)

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