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Proceedings Paper

Study of silicon solar cell double-triangular nano-gratings
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Paper Abstract

This study concentrates on solar light absorption power in a silicon solar cell using a double diffraction triangular nano-grating. The first grating is located on top of the solar cell and the second grating is located on bottom of the solar cell above a reflective metallic substrate of Ar (Si3 N4 ) (Argon gas mixed with Silicon Nitride). We simulate the solar cell behavior over varying grating parameters as it absorbs sunlight and compare the average power output absorbed at the center of the solar cell. Each case simulates a period (At ) that varies from 100nm to 800nm in 100nm interval for the top lattice, while maintaining the bottom lattice at a constant period (Ab ). We repeat this procedure for the bottom lattice, changing the lattice period from 100nm to 800nm in 100nm interval in order to find the optimized case. We also consider solar spectrum irradiation under wavelengths ranging from 300nm to 1100nm in 50nm intervals. The total power absorption improvement is about 170% compared to the non-grating case, occurring in the weighted solar cell simulation with top grating period greater than 300nm and bottom grating period of 500nm.

Paper Details

Date Published: 3 March 2012
PDF: 8 pages
Proc. SPIE 8255, Physics and Simulation of Optoelectronic Devices XX, 825517 (3 March 2012); doi: 10.1117/12.906720
Show Author Affiliations
Ashton Ellaboudy, California Polytechnic State Univ., San Luis Obispo (United States)
Michael James Marshall, California Polytechnic State Univ., San Luis Obispo (United States)
Greg Chavoor, California Polytechnic State Univ., San Luis Obispo (United States)
Xiaomin Jin, California Polytechnic State Univ., San Luis Obispo (United States)


Published in SPIE Proceedings Vol. 8255:
Physics and Simulation of Optoelectronic Devices XX
Bernd Witzigmann; Marek Osinski; Fritz Henneberger; Yasuhiko Arakawa, Editor(s)

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